英国论文代写：纳米压印光刻方法

英国论文代写：纳米压印光刻方法。与传统方法相比，纳米压印光刻方法NIL是通过直接变形的抗蚀剂而不是通过光电子修饰来工作的。这意味着可以在制造过程中识别出更多的主动分辨率，并更好地控制特征尺寸。这提高了NIL的使用和研究范围。然而，限制和衰落的行业威胁到它的范围。接下来英国论文代写将为同学们讲解下纳米压印光刻方法。

NIL有利于大批量生产。在研究中建立了它对小特征的分辨能力，具有更好的分辨率、均匀性和线粗糙度。通量是纳米压印技术的一个重要问题，而纳米压印光刻具有比传统方法更好的通量。

缺点是缺陷问题仍然需要控制。此外，随着时间的推移，详细的测试级别是必要的，以了解技术的全部潜力。然而，技术问题不是NIL的最大挑战，挑战是衰落的半导体和硬盘行业。“大多数半导体制造商已经决定未来的节点采用EUV或193i双模式。只有一小部分人在积极研究纳米印记”(Malloy & Litt, 2011, p. 032011)。

NIL技术本身被认为是对传统技术的潜在改进，因为它不使用光子或电子来修改电阻，从而提高了整体分辨率。

空图像的分辨率主要取决于需要制作的模板特征尺寸。它的特征尺寸受到模具的很大限制，纳米压印掩模本身必须使用其他光刻技术来制作。在未来的工作中，这些限制中的大多数都有可能得到很好的处理。自组装结构可以在10nm甚至更小的尺度上呈现周期性图案。模板生成问题也可以通过使用双模式诱导模式来解决。

NIL is beneficial for high volume manufacturing. Its ability to resolve small features, with better resolution, uniformity and line roughness is established in research. Throughput is a serious concern for nanoimprint technologies and nanoimprint lithography has a better throughput than traditional methods.

The cons are that the issue of defects still has to be controlled. Furthermore, elaborate levels of testing over time are necessary to understand the full potential of the technology. Technical issues however are not the biggest challenge for NIL, the challenges are that of the declining semiconductor and the HDD industries. “Most semiconductor manufacturers have decided on EUV or 193i double patterning for future nodes. Only a small number is actively investigating nanoimprint” (Malloy & Litt, 2011, p. 032011).

The NIL technology in itself is understood as a potential improvement over traditional technology in the way it does not make use of photons or electrons for modifying the resist and this way improves overall resolution.

The resolution of NIL mainly depends on the template feature size that must be fabricated. Its feature size is very much limited by molds and the nanoimprint mask itself has to be created by making use of other lithography techniques. In future work it is possible that most of these limitations would be handled well. Self-assembly structures could be created that would present periodic patterns at 10nm scales or even lesser. Template generation issue might also be addressed by making use of a double pattern inducted scheme.

以上内容就是英国论文代写为同学们讲解的纳米压印光刻方法。如果留学生们有需要论文代写辅导的地方，论文代写推荐留学生选择英国论文代写Advancedthesis服务公司。因为其服务公司的论文创作专家团队由高素质和经验丰富的学术作家组成，保障论文创作质量且没有任何抄袭或剽窃行为。除此之外，还为留学生们提供硕士论文代写、essay代写、毕业论文代写等服务，而且代写论文价格公平合理，保证论文原创，并使用权威的抄袭检测系统，避免论文出现重复率过高的情况发生，从而让留学生们轻松应对论文写作并创作出专属个人的优秀论文!